Authors

Weber, U.; Boissière, O.; Lindner, J.; Schuhmacher, M.; Lehnen, Peer; Manke, C.; Van Elshocht, Sven; Caymax, Matty; Cosnier, V.; McEntee, T.

Conference

Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-Based CMOS: New Materials, Processes, and Equipment

Title

Improving CMOS performance by AVD® grown high-k dielectrics and advanced metal electrodes

Publication type

Proceedings paper