Browsing by author "Hwang, cheol seong"
Now showing items 1-4 of 4
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Atomic layer deposition process of Hf-based high-k gate dielectric film on Si substrate
Park, Tae Joo; Cho, Moon Ju; Jung, Hyung-Suk; Hwang, cheol seong (2012-08) -
Front end of the line process
Han, Jeong Hwan; Cho, Moon Ju; Delabie, Annelies; Park, Tae Joo; Hwang, cheol seong (2014) -
Influences of metal, non-metal precursors, and substrates on atomic layer deposition processes
Han, Jeong Hwan; Lee, Sang Woon; Choi, Byung Joon; Eom, Taeyong; Kim, Seong Keun; Song, Seul Ji; Lee, Woongkyu; Hwang, cheol seong (2013) -
Study of the reliability impact of chlorine precursor residues in the Atomic Layer Deposited HfO2 layers
Cho, Moon Ju; Degraeve, Robin; Pourtois, Geoffrey; Delabie, Annelies; Ragnarsson, Lars-Ake; Kauerauf, Thomas; Groeseneken, Guido; De Gendt, Stefan; Heyns, Marc; Hwang, cheol seong (2007-04)