Publication:
Atomic layer deposition process of Hf-based high-k gate dielectric film on Si substrate
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1965 since deposited on 2021-10-20
3last month
1last week
Acq. date: 2026-01-06
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Views
1965 since deposited on 2021-10-20
3last month
1last week
Acq. date: 2026-01-06
Citations