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Atomic layer deposition process of Hf-based high-k gate dielectric film on Si substrate
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Atomic layer deposition process of Hf-based high-k gate dielectric film on Si substrate
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Date
2012
Book Chapter
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Park, Tae Joo
;
Cho, Moon Ju
;
Jung, Hyung-Suk
;
Hwang, cheol seong
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1970
since deposited on 2021-10-20
Acq. date: 2026-08-03
Citations
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Views
1970
since deposited on 2021-10-20
Acq. date: 2026-08-03
Citations