Browsing by author "Storck, Peter"
Now showing items 1-5 of 5
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Epitaxial growth of active Si on top of SiGe etch stop layer in view of 3D device integration
Loo, Roger; Jourdain, Anne; Rengo, Gianluca; Porret, Clément; Hikavyy, Andriy; Liebens, Maarten; Becker, Lucas; Storck, Peter; Beyer, Gerald; Beyne, Eric (2020-09) -
Epitaxial growth of active Si on top of SiGe etch stop layer in view of 3D device integration
Loo, Roger; Jourdain, Anne; Rengo, Gianluca; Porret, Clément; Hikavyy, Andriy; Liebens, Maarten; Becker, Lucas; Storck, Peter; Beyer, Gerald; Beyne, Eric (2020-07) -
Smooth and high quality epitaxial strained Ge grown on SiGe strain relaxed buffers with 70 - 85% Ge
Loo, Roger; Souriau, Laurent; Ong, Patrick; Kenis, Karine; Rip, Jens; Storck, Peter; Buschhardt, Thomas; Vorderwester, Martin (2010-05) -
Strained germanium gate-all-around pMOS device demonstration using selective wire release etch prior to replacement metal gate deposition
Witters, Liesbeth; Arimura, Hiroaki; Sebaai, Farid; Hikavyy, Andriy; Milenin, Alexey; Loo, Roger; De Keersgieter, An; Eneman, Geert; Schram, Tom; Wostyn, Kurt; Devriendt, Katia; Schulze, Andreas; Lieten, Ruben; Bilodeau, S; Cooper, E; Storck, Peter; Chiu, Eddy; Vrancken, Christa; Favia, Paola; Vancoille, Eric; Mitard, Jerome; Langer, Robert; Opdebeeck, Ann; Holsteyns, Frank; Waldron, Niamh; Barla, Kathy; De Heyn, Vincent; Mocuta, Dan; Collaert, Nadine (2017) -
Strained germanium gate-all-around PMOS device demonstration using selective wire release etch prior to replacement metal gate deposition
Witters, Liesbeth; Sebaai, Farid; Hikavyy, Andriy; Milenin, Alexey; Loo, Roger; De Keersgieter, An; Eneman, Geert; Schram, Tom; Wostyn, Kurt; Devriendt, Katia; Schulze, Andreas; Lieten, Ruben; Bilodeau, S; Cooper, E; Storck, Peter; Vrancken, Christa; Arimura, Hiroaki; Favia, Paola; Vancoille, Eric; Mitard, Jerome; Langer, Robert; Opdebeeck, Ann; Holsteyns, Frank; Waldron, Niamh; Barla, Kathy; De Heyn, Vincent; Mocuta, Dan; Collaert, Nadine (2017-06)