Browsing by author "Wilk, G."
Now showing items 1-5 of 5
-
ALCVD hafnium silicates for low power gate stacks
Maes, Jan; Laitinen, O.; De Witte, Hilde; Deweerd, Wim; Delabie, Annelies; Conard, Thierry; Brijs, Bert; Wang, C. - G.; Velasco, H.; Wilk, G. (2004) -
Atomic layer deposition of hafnium silicate from HfCl4, SiCl4, and H2O
Fedorenko, Yanina; Swerts, Johan; Maes, Jan; Tois, E.; Haukka, S.; Wang, C.G; Wilk, G.; Delabie, Annelies; Deweerd, Wim; De Gendt, Stefan (2007) -
Atomic layer deposition: an enabling technology for microelectronic device manufacturing
Lee, F.; Marcus, S.; Shero, E.; Wilk, G.; Swerts, Johan; Maes, Jan; Blomberg, T.; Delabie, Annelies; Gros-Jean, M.; Deloffre, E. (2007) -
Impact of Hf-precursor choice on scaling and performance of high-k gate dielectrics
Maes, Jan; Fedorenko, Yanina; Delabie, Annelies; Ragnarsson, Lars-Ake; Swerts, Johan; Nyns, Laura; Van Elshocht, Sven; Wang, C.; Wilk, G. (2007) -
Nitrided hafnium silicates for gate dielectrics
Wang, C.G.; Velasco, H.; Verghese, M.; Shero, E.; Wilk, G.; Maes, Jan; Laitinen, O.; Deweerd, Wim; Delabie, Annelies; Opila, R.L.; Mathew, A.; Demirkan, K.; Morais, J.; Baumvol, I.J.R. (2004)