Now showing items 1-3 of 3

    • Application of a new approach to optical proximity correction 

      Rosenbusch, A.; Hourd, A.; Juffermans, Casper; Kirsch, H.; Lalanne, F.; Maurer, W.; Romeo, C.; Ronse, Kurt; Schiavone, P.; Simecek, M.; Toublan, O.; Vermeulen, Tom; Watson, J.; Ziegler, W.; Zimmerman, R. (1999)
    • Lithographic performance of 193 nm resist 

      Goethals, Mieke; Pollers, Ingrid; Van Roey, Frieda; Sugihara, Takashi; Ronse, Kurt; Heskamp, B.; Davies, G.; Gehoel-van Ansem, W.; Paniez, P.; Temerson, T. M.; Hien, S.; Mortini, B.; Romeo, C. (1998)
    • New approach to optical proximity correction 

      Rosenbusch, A.; Hourd, A.; Juffermans, C.; Kirsch, H.; Lalanne, F.; Maurer, W.; Romeo, C.; Ronse, Kurt; Schiavone, P.; Simecek, M.; Toublan, O.; Watson, J.; Ziegler, W.; Zimmermann, R. (1998)