Lithographic performance of 193 nm resist

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Authors
Goethals, Mieke; Pollers, Ingrid; Van Roey, Frieda; Sugihara, Takashi; Ronse, Kurt; Heskamp, B.; Davies, G.; Gehoel-van Ansem, W.; Paniez, P.; Temerson, T. M.; Hien, S.; Mortini, B.; Romeo, C.
Conference
193nm '98. At the Peak. 4th International Symposium on 193 nm Lithography. Abstracts Book
Title
Lithographic performance of 193 nm resist
Publication type
Proceedings paper
Embargo date
9999-12-31
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