Now showing items 1-2 of 2

    • A novel fully self-aligned SiGe:C HBT architecture featuring a single step epitaxial collector-base process 

      Donkers, Johan; Kramer, Mark; Van Huylenbroeck, Stefaan; Choi, Li Jen; Meunier-Beillard, Philippe; Boccardi, Guillaume; van Noort, W.; Hurkx, G.A.M.; Vanhoucke, Tony; Sibaja-Hernandez, Arturo; Vleugels, Frank; Winderickx, Gillis; Kunnen, Eddy; Peeters, Stefan; Baute, Debbie; De Vos, Brecht; Vandeweyer, Tom; Loo, Roger; Venegas, Rafael; Pijper, R.; Decoutere, Stefaan; Hijzen, Erwin (2007)
    • Strain enhanced FUSI/HfSiON technology with optimized CMOS process window 

      Veloso, Anabela; Verheyen, Peter; Vos, Rita; Brus, Stephan; Ito, Satoru; Mitsuhashi, Riichirou; Paraschiv, Vasile; Shi, Xiaoping; Onsia, Bart; Arnauts, Sophia; Loo, Roger; Lauwers, Anne; Conard, Thierry; de Marneffe, Jean-Francois; Goossens, Danny; Baute, Debbie; Locorotondo, Sabrina; Chiarella, Thomas; Kerner, Christoph; Vrancken, Christa; Mertens, Sofie; O'Sullivan, Barry; Yu, HongYu; Chang, Shou-Zen; Niwa, Masaaki; Kittl, Jorge; Absil, Philippe; Jurczak, Gosia; Hoffmann, Thomas Y.; Biesemans, Serge (2007)