Browsing by author "Perello, Carles"
Now showing items 1-8 of 8
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A high performance 0.18µm elevated source/drain technology with improved manufacturability
Augendre, Emmanuel; Rooyackers, Rita; Vandamme, Ewout; Perello, Carles; Van Dievel, Marc; Pochet, Sandrine; Badenes, Gonçal (1999) -
A high performance of 0.18μm CMOS technology designed for manufacturability
Badenes, Gonçal; Hendriks, Marton; Perello, Carles; Deferm, Ludo (1997) -
A new dummy-free shallow trench isolation concept for mixed-signal applications
Badenes, Gonçal; Rooyackers, Rita; Augendre, Emmanuel; Vandamme, Ewout; Perello, Carles; Heylen, Nancy; Grillaert, Joost; Deferm, Ludo (1999) -
A new dummy-free shallow trench isolation concept for mixed-signal applications
Badenes, Gonçal; Rooyackers, Rita; Augendre, Emmanuel; Vandamme, Ewout; Perello, Carles; Heylen, Nancy; Grillaert, Joost; Deferm, Ludo (2000) -
Elevated source/drain by sacrificial selective epitaxy for high performance deep submicron CMOS: process window versus complexity
Augendre, Emmanuel; Rooyackers, Rita; Caymax, Matty; Vandamme, Ewout; De Keersgieter, An; Perello, Carles; Van Dievel, Marc; Pochet, Sandrine; Badenes, Gonçal (2000) -
L-shape spacer architecture for low cost, high performance CMOS
Augendre, Emmanuel; Perello, Carles; Vandamme, Ewout; Pochet, Sandrine; Rooyackers, Rita; Beckx, Stephan; de Potter de ten Broeck, Muriel; Lauwers, A.; Badenes, Gonçal (2001) -
Optimisation of critical parameters in a low cost, high performance deep submicron CMOS technology
Badenes, Gonçal; Perello, Carles; Rupp, Andreas; Vandamme, Ewout; Augendre, Emmanuel; Pochet, Sandrine; Deferm, Ludo (1999) -
Test structures for MCM-D technology characterization
Lozano, M.; Santander, J.; Cabruja, E.; Perello, Carles; Ullan, M.; Lora-Tamayo, E.; Doyle, R.; McCarthy, C.; Barton, J. (1999)