Browsing by author "Mack, P."

HfSiO(N) composition depth profiling: can we get a quantitative answer using SIMS?

Conard, Thierry; Chen, Ping; Janssens, Tom; Brijs, Bert; Vandervorst, Wilfried; Van Elshocht, Sven; Mack, P.; Weber, U.; Lehnen, P. (2005)

Multitechnique characterisation of Al203 thin layers deposited on SiO2/Si surface by atomic layer chemical vapour deposition

Houssiau, L.; Vitchev, R.G.; Pireaux, J.J.; Conard, Thierry; Bender, Hugo; Richard, Olivier; Mack, P.; Wolstenholme, J.; Defranoux, C. (2003)

Nitrogen profiling in high-k layers has much to gain from a combined TOFSIMS-Angle resolved XPS combined study

Conard, Thierry; Vandervorst, Wilfried; Brijs, Bert; Mack, P. (2005)

Physical characterization of mixed HfAlOx layers by complementary analysis techniques

Bender, Hugo; Conard, Thierry; Richard, Olivier; Brijs, Bert; Petry, Jasmine; Vandervorst, Wilfried; Defranoux, C.; Boher, P.; Rochat, N.; Wyon, C.; Mack, P.; Wolstenholme, J.; Vitchev, E.; Houssiau, L.; Pireaux, J-J.; Bergmaier, A.; Dollinger, G. (2004)

Physical characterization of thin HfO2 layers by the combined analysis with complementary techniques

Bender, Hugo; Conard, Thierry; Richard, Olivier; Brijs, Bert; Petry, Jasmine; Vandervorst, Wilfried; Defranoux, C.; Boher, P.; Rochat, N.; Wyon, C.; Mack, P.; Wolstenholme, J.; Vitchev, R.; Houssiau, L.; Pireaux, J.J.; Bergmaier, A.; Dollinger, G. (2003)