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Multitechnique characterisation of Al203 thin layers deposited on SiO2/Si surface by atomic layer chemical vapour deposition
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Multitechnique characterisation of Al203 thin layers deposited on SiO2/Si surface by atomic layer chemical vapour deposition
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Date
2003
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Houssiau, L.
;
Vitchev, R.G.
;
Pireaux, J.J.
;
Conard, Thierry
;
Bender, Hugo
;
Richard, Olivier
;
Mack, P.
;
Wolstenholme, J.
;
Defranoux, C.
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1966
since deposited on 2021-10-15
Acq. date: 2025-12-11
Citations
Metrics
Views
1966
since deposited on 2021-10-15
Acq. date: 2025-12-11
Citations