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Multitechnique characterisation of Al203 thin layers deposited on SiO2/Si surface by atomic layer chemical vapour deposition
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Authors
Houssiau, L.
;
Vitchev, R.G.
;
Pireaux, J.J.
;
Conard, Thierry
;
Bender, Hugo
;
Richard, Olivier
;
Mack, P.
;
Wolstenholme, J.
;
Defranoux, C.
Conference
AVS 4th International Conference on Microelectronics and Interfaces - ICMI
Title
Multitechnique characterisation of Al203 thin layers deposited on SiO2/Si surface by atomic layer chemical vapour deposition
Publication type
Proceedings paper
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