Publication:

Multitechnique characterisation of Al203 thin layers deposited on SiO2/Si surface by atomic layer chemical vapour deposition

Date

2003
Proceedings Paper
Simple item page Full metadata Statistics
 
dc.contributor.authorHoussiau, L.
dc.contributor.authorVitchev, R.G.
dc.contributor.authorPireaux, J.J.
dc.contributor.authorConard, Thierry
dc.contributor.authorBender, Hugo
dc.contributor.authorRichard, Olivier
dc.contributor.authorMack, P.
dc.contributor.authorWolstenholme, J.
dc.contributor.authorDefranoux, C.
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorRichard, Olivier
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.date.accessioned2021-10-15T04:57:35Z
dc.date.available2021-10-15T04:57:35Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7668
dc.source.beginpage36
dc.source.conferenceAVS 4th International Conference on Microelectronics and Interfaces - ICMI
dc.source.conferencedate3/03/2003
dc.source.conferencelocationSanta Clara, CA USA
dc.source.endpage38
dc.title

Multitechnique characterisation of Al203 thin layers deposited on SiO2/Si surface by atomic layer chemical vapour deposition

dc.typeProceedings paper
dspace.entity.typePublication
Files
Publication available in collections:
Conference contributions