Authors

Bender, Hugo; Conard, Thierry; Richard, Olivier; Brijs, Bert; Petry, Jasmine; Vandervorst, Wilfried; Defranoux, C.; Boher, P.; Rochat, N.; Wyon, C.; Mack, P.; Wolstenholme, J.; Vitchev, R.; Houssiau, L.; Pireaux, J.J.; Bergmaier, A.; Dollinger, G.

Conference

Analytical Techniques for Semiconductor Materials and Processes

Title

Physical characterization of thin HfO2 layers by the combined analysis with complementary techniques

Publication type

Proceedings paper