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Physical characterization of thin HfO2 layers by the combined analysis with complementary techniques
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Physical characterization of thin HfO2 layers by the combined analysis with complementary techniques
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Date
2003
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Bender, Hugo
;
Conard, Thierry
;
Richard, Olivier
;
Brijs, Bert
;
Petry, Jasmine
;
Vandervorst, Wilfried
;
Defranoux, C.
;
Boher, P.
;
Rochat, N.
;
Wyon, C.
;
Mack, P.
;
Wolstenholme, J.
;
Vitchev, R.
;
Houssiau, L.
;
Pireaux, J.J.
;
Bergmaier, A.
;
Dollinger, G.
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1935
since deposited on 2021-10-15
3
last month
Acq. date: 2025-12-10
Citations
Metrics
Views
1935
since deposited on 2021-10-15
3
last month
Acq. date: 2025-12-10
Citations