Browsing by author "Turovets, Igor"
Now showing items 1-5 of 5
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Innovative scatterometry approach for self-aligned quadruple patterning (SAQP) process control
Gunay Demirkol, Anil; Altamirano Sanchez, Efrain; Héraud, Stéphane; Godny, Stephane; Charley, Anne-Laure; Leray, Philippe; Urenski, Ronen; Cohen, Oded; Turovets, Igor; Wolfling, Shay (2016) -
Metrology of Thin Resist for High NA EUVL
Lorusso, Gian; Beral, Christophe; Bogdanowicz, Janusz; De Simone, Danilo; Hasan, Mahmudul; Jehoul, Christiane; Moussa, Alain; Saib, Mohamed; Zidan, Mohamed; Severi, Joren; Truffert, Vincent; Van Den Heuvel, Dieter; Goldenshtein, Alex; Houchens, Kevin; Santoro, Gaetano; Fischer, Daniel; Muellender, Angelika; Hung, Joey; Koret, Roy; Turovets, Igor; Ausschnitte, Kit; Mack, Chris; Kondo, Tsuyoshi; Shohjoh, Tomoyasu; Ikota, Masami; Charley, Anne-Laure; Leray, Philippe (2022) -
Plasma halogenated amorphous carbon as growth inhibiting layer for area-selective deposition of titanium oxide
Krishtab, Mikhail; Hung, Joey; Koret, Roy; Turovets, Igor; Shah, Kavita; Rangarajan, Srinivasan; Warad, Laxmi; Zhang, Vanessa; Ameloot, Rob; Armini, Silvia (2020) -
Scatterometry and AFM measurement combination for area selective deposition process characterization
Saib, Mohamed; Moussa, Alain; Charley, Anne-Laure; Leray, Philippe; Hung, Joey; Koret, Roy; Turovets, Igor; Ger, Avron; Deng, Shaoren; Illiberi, Andrea; Maes, Jan Willem; Woodworth, Gabriel; Strauss, Michael (2019) -
Scatterometry solutions for 14nm half-pitch BEOL layers patterned by EUV single exposure
Das, Sayantan; Hung, Joey; Halder, Sandip; Koret, Roy; Turovets, Igor; Charley, Anne-Laure; Leray, Philippe (2021)