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Plasma halogenated amorphous carbon as growth inhibiting layer for area-selective deposition of titanium oxide
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Authors
Krishtab, Mikhail
;
Hung, Joey
;
Koret, Roy
;
Turovets, Igor
;
Shah, Kavita
;
Rangarajan, Srinivasan
;
Warad, Laxmi
;
Zhang, Vanessa
;
Ameloot, Rob
;
Armini, Silvia
Conference
Metrology, Inspection, and Process Control for Microlithography XXXIV
Title
Plasma halogenated amorphous carbon as growth inhibiting layer for area-selective deposition of titanium oxide
Publication type
Proceedings paper
Embargo date
9999-12-31
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