Publication:
Plasma halogenated amorphous carbon as growth inhibiting layer for area-selective deposition of titanium oxide
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2001 since deposited on 2021-10-28
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Acq. date: 2026-10-05
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Statistics
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2001 since deposited on 2021-10-28
3last month
3last week
Acq. date: 2026-10-05
Citations