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Plasma halogenated amorphous carbon as growth inhibiting layer for area-selective deposition of titanium oxide
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Plasma halogenated amorphous carbon as growth inhibiting layer for area-selective deposition of titanium oxide
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Date
2020
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Krishtab, Mikhail
;
Hung, Joey
;
Koret, Roy
;
Turovets, Igor
;
Shah, Kavita
;
Rangarajan, Srinivasan
;
Warad, Laxmi
;
Zhang, Vanessa
;
Ameloot, Rob
;
Armini, Silvia
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1992
since deposited on 2021-10-28
Acq. date: 2025-12-09
Citations
Metrics
Views
1992
since deposited on 2021-10-28
Acq. date: 2025-12-09
Citations