Browsing by author "Claes, M."

Controlled deposition of organic contamination and removal with ozone-based cleaning

Claes, M.; De Gendt, Stefan; Kenens, Conny; Conard, Thierry; Bender, Hugo; Storm, Wolfgang; Bauer, T.; Mertens, Paul; Heyns, Marc (2001)

Determination of degradation products in O3/DI processes

Vankerckhoven, Hans; De Smedt, Frank; Van Herp, Bart; Claes, M.; De Gendt, Stefan; Heyns, Marc; Vinckier, Chris (2001)

Developments in cleaning technology for critical layers

Heyns, Marc; Arnauts, Sophia; Bearda, Twan; Claes, M.; Cornelissen, Ingrid; De Gendt, Stefan; Doumen, Geert; Fyen, Wim; Loewenstein, Lee; Lux, Marcel; Mertens, Paul; Mertens, S.; Meuris, Marc; Onsia, Bart; Röhr, Erika; Schaekers, Marc; Teerlinck, Ivo; Van Doorne, Patrick; Van Hoeymissen, Jan; Vereecke, Guy; Vos, Rita; Wolke, K. (2000)

Making the cleaner greener

Bergman, E.; Lagrange, Sébastien; Claes, M. (2001)

Ozonated HF applications in a spray processing tool

Claes, M.; Röhr, Erika; De Gendt, Stefan; Heyns, Marc; Lagrange, Sébastien; Bergman, E. (2001)

Quantification problems in light element determination by grazing emission X-ray fluorescence

Kuczumow, A.; Claes, M.; Schmeling, M.; Van Grieken, R.; De Gendt, Stefan (2000)

Removal of photoresist by O3DI water processes: determination of degradation products

Vankerckhoven, Hans; De Smedt, Frank; Vinckier, Chris; Van Herp, Bart; Claes, M.; De Gendt, Stefan; Heyns, Marc (2001)

The increasing importance of the use of ozone in micro-electronics industry

De Smedt, Frank; De Gendt, Stefan; Claes, M.; Heyns, Marc; Vankerckhoven, Hans; Vinckier, Chris (2001)

The removal of organic contamination by O3/DI water processes: a theoretical study

De Smedt, Frank; Vankerckhoven, Hans; Vinckier, Chris; De Gendt, Stefan; Claes, M.; Heyns, Marc (2001)

Use of grazing emission XRF for silicon wafer surface contamination measurements

De Gendt, Stefan; Kenis, Karine; Mertens, Paul; Heyns, Marc; Claes, M.; Van Grieken, R. E.; Bailleul, A.; Knotter, Martin; De Bokx, P. K. (1996)