Browsing by author "Friedrich, Daniel"
Now showing items 1-4 of 4
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Fullerene based materials for ultra-low-k application
Broczkowska, Katarzyna; Klocek, Jolanta; Friedrich, Daniel; Kolanek, Krzysztof; Urbanowicz, Adam; Scheisser, Dieter; Miller, Miroslaw; Zschech, Ehrenfried (2010) -
In-situ studies of the chemistry of trimethyl-aluminum on III-V semiconductor surfaces
Adelmann, Christoph; Tallarida, Massimo; Cuypers, Daniel; Rodriguez, Leonard; Michling, Marcel; Friedrich, Daniel; De Clercq, Astrid; Delabie, Annelies; Conard, Thierry; Van Elshocht, Sven; Locquet, Jean-Pierre; Schmeisser, Dieter; Caymax, Matty (2012) -
Interface chemistry of Al2O3/III-V upon atomic layer deposition
Tallarida, Massimo; Adelmann, Christoph; Cuypers, Daniel; Rodriguez, Leonard; Lin, Dennis; Michling, Marcel; Friedrich, Daniel; De Clercq, Astrid; Delabie, Annelies; Van Elshocht, Sven; Locquet, Jean-Pierre; Caymax, Matty; Schmeisser, Dieter (2012) -
Surface chemistry and interface formation during the atomic layer deposition of alumina from trimethyl aluminum and water on indium phosphide
Adelmann, Christoph; Cuypers, Daniel; Tallarida, Massimo; Rodriguez, Leonard; De Clercq, Astrid; Friedrich, Daniel; Conard, Thierry; Delabie, Annelies; Seo, Jin Won; Locquet, Jean-Pierre; De Gendt, Stefan; Schmeisser, Dieter; Van Elshocht, Sven; Caymax, Matty (2013)