Browsing by author "De Waele, Rita"

Now showing items 1-4 of 4

    • Advanced wafer surface cleaning technology 

      Mertens, Paul; Vos, Rita; Vereecke, Guy; Arnauts, Sophia; Bearda, Twan; De Waele, Rita; Eitoku, Atsuro; Fyen, Wim; Geckiere, J.; Hellin, David; Holsteyns, Frank; Kesters, Els; Claes, Martine; Kenis, Karine; Kraus, Harald; Malhouitre, Stephane; Lee, Kuntack; Kocsis, Michael; Onsia, Bart; Garaud, Sylvain; Rip, Jens; Snow, Jim; Teerlinck, I.; Van Hoeymissen, Jan; Barbagini, Francesca; Xu, Kaidong; Paraschiv, Vasile; De Gendt, Stefan; Mannaert, Geert; Heyns, Marc (2004)

    • Quantitative modeling of H2O2 decomposition in SC1 

      Mertens, Paul; Baeyens, Martien; Moyaerts, Gert; Okorn-Schmidt, H. F.; Vos, Rita; De Waele, Rita; Hatcher, Z.; Hub, W.; De Gendt, Stefan; Knotter, Martin; Meuris, Marc; Heyns, Marc (1998)

    • Wafer backside cleaning strategies for high-k/metal gate processing 

      Vos, Rita; Kesters, Els; Garaud, Sylvain; De Waele, Rita; Kenis, Karine; Lux, Marcel; Kraus, Harald; Snow, Jim; Shamiryan, Denis; Catana, Gabriela; Deweerd, Wim; Schram, Tom; De Gendt, Stefan; Mertens, Paul (2004)

    • Wafer backside cleaning strategies for high-k/metal gate processing 

      Vos, Rita; Kesters, Els; Garaud, Sylvain; De Waele, Rita; Kenis, Karine; Lux, Marcel; Kraus, Harald; Snow, Jim; Shamiryan, Denis; Catana, Gabriela; Deweerd, Wim; Schram, Tom; De Gendt, Stefan; Mertens, Paul (2005)