Browsing by author "Birkner, Robert"
Now showing items 1-6 of 6
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AIMS TM 45 inspection of CH treated with inverse lithography
Hendrickx, Eric; Birkner, Robert; Kempsell, Monica; Tritchkov, Alexander; Richter, Rigo; Vandenberghe, Geert; Scheruebl, Thomas (2008) -
Impact of alternative mask stacks on the imaging performance at NA 1.20 and above
Philipsen, Vicky; Mesuda, Kei; De Bisschop, Peter; Erdmann, Andreas; Citarella, Giuseppe; Evanschitzky, Peter; Birkner, Robert; Richter, Rigo; Scherübl, Thomas (2007) -
Phame: phase measurements on 45nm node phase shift features
Buttgereit, Ute; Birkner, Robert; Seidel, Dirk; Perlitz, Sacha; Philipsen, Vicky; De Bisschop, Peter (2008) -
Phase behavior through pitch and duty cycle and its impact on process window
Buttgereit, Ute; Birkner, Robert; Seidel, Dirk; Perlitz, Sacha; Philipsen, Vicky; De Bisschop, Peter (2009) -
Test of vector effect emulation of the AIMSTM45-193i
De Bisschop, Peter; Philipsen, Vicky; Birkner, Robert; Richter, Rigo; Scheruebl, Thomas (2007) -
Using the AIMS 45-193i for hyper-NA imaging applications
De Bisschop, Peter; Philipsen, Vicky; Birkner, Robert; Buttgereit, Uwe; Richter, Rigo; Scherübl, Thomas (2007)