Phame: phase measurements on 45nm node phase shift features

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Authors
Buttgereit, Ute; Birkner, Robert; Seidel, Dirk; Perlitz, Sacha; Philipsen, Vicky; De Bisschop, Peter
Conference
Photomask and Next-Generation Lithography Mask Technology XV
Title
Phame: phase measurements on 45nm node phase shift features
Publication type
Proceedings paper
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