Publication:
Phame: phase measurements on 45nm node phase shift features
Date
| dc.contributor.author | Buttgereit, Ute | |
| dc.contributor.author | Birkner, Robert | |
| dc.contributor.author | Seidel, Dirk | |
| dc.contributor.author | Perlitz, Sacha | |
| dc.contributor.author | Philipsen, Vicky | |
| dc.contributor.author | De Bisschop, Peter | |
| dc.contributor.imecauthor | Philipsen, Vicky | |
| dc.contributor.imecauthor | De Bisschop, Peter | |
| dc.contributor.orcidimec | Philipsen, Vicky::0000-0002-2959-432X | |
| dc.date.accessioned | 2021-10-17T06:25:26Z | |
| dc.date.available | 2021-10-17T06:25:26Z | |
| dc.date.issued | 2008 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/13467 | |
| dc.source.beginpage | 70282Z | |
| dc.source.conference | Photomask and Next-Generation Lithography Mask Technology XV | |
| dc.source.conferencedate | 16/04/2008 | |
| dc.source.conferencelocation | Yokohama Japan | |
| dc.title | Phame: phase measurements on 45nm node phase shift features | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | ||
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