Browsing by author "Zou, Gang"
Now showing items 1-3 of 3
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Elimination of HF-last cleaning related CoSi2 defects formation
Zou, Gang; Jonckx, Franky; Alves Donaton, Ricardo; Kuper, Werner; Maex, Karen; Mertens, Paul; Meuris, Marc; Heyns, Marc; Locke, Klaus; Korac, M.; Schild, R. (1994) -
Improvement and evaluation of drying techniques for HF-last wafer cleaning
Li, Li; Zou, Gang; Bender, Hugo; Mertens, Paul; Meuris, Marc; Schmidt, Harald; Heyns, Marc (1994) -
Improvement of high temperature water rinsing and drying for HF-last wafer cleaning
Li, Li; Bender, Hugo; Zou, Gang; Mertens, Paul; Meuris, Marc; Heyns, Marc (1996)