Improvement of high temperature water rinsing and drying for HF-last wafer cleaning

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Authors

Li, Li; Bender, Hugo; Zou, Gang; Mertens, Paul; Meuris, Marc; Heyns, Marc

Issue

1

Journal

Journal of the Electrochemical Society

Volume

143

Title

Improvement of high temperature water rinsing and drying for HF-last wafer cleaning

Publication type

Journal article

Embargo date

9999-12-31

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