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Articles
Improvement of high temperature water rinsing and drying for HF-last wafer cleaning
Publication:
Improvement of high temperature water rinsing and drying for HF-last wafer cleaning
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Date
1996
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Li, Li
;
Bender, Hugo
;
Zou, Gang
;
Mertens, Paul
;
Meuris, Marc
;
Heyns, Marc
Journal
Journal of the Electrochemical Society
Abstract
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1942
since deposited on 2021-09-29
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Acq. date: 2026-04-28
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Statistics
Views
1942
since deposited on 2021-09-29
4
last month
1
last week
Acq. date: 2026-04-28
Citations