Browsing by author "Hepp, Birgitt"
Now showing items 1-5 of 5
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Critical assessment of error budget components in double patterning immersion lithography
Hepp, Birgitt; Finders, Jo; Dusa, Mircea; Vleeming, Bert; Megens, henry; Maenhoudt, Mireille; Cheng, Shaunee; Vandeweyer, Tom (2008) -
Dense lines created by spacer DPT scheme: process control by local dose adjustment using advanced scanner control
Finders, Jo; Dusa, Mircea; Vleeming, Bert; Fliervoet, Timon; Hepp, Birgitt; Megens, henry; Groenendijk, Remco; Quaedackers, John; Mos, Evert; Leewis, Christian; Bornebroek, Frank; Maenhoudt, Mireille; Leblans, Marc; Vandeweyer, Tom; Murdoch, Gayle; Altamirano Sanchez, Efrain (2009) -
Double patterning for 32-nm and below: an update
Finders, Jo; Dusa, Mircea; Vleeming, Bert; Hepp, Birgitt; Megens, Henry; Maenhoudt, Mireille; Cheng, Shaunee; Vandeweyer, Tom (2008) -
Double patterning lithography for 32 nm: critical dimensions uniformity and overlay control considerations
Finders, Jo; Dusa, Mircea; Vleeming, Bert; Hepp, Birgitt; Maenhoudt, Mireille; Cheng, Shaunee; Vandeweyer, Tom (2009) -
Spacer self aligned double patterning: process control
Vandeweyer, Tom; Altamirano Sanchez, Efrain; Vangoidsenhoven, Diziana; Murdoch, Gayle; Groenendijk, Remco; Hepp, Birgitt; Mos, Evert; Finders, Jo; Vleeming, Bert; Dusa, Mircea; Maenhoudt, Mireille (2009)