Authors

Finders, Jo; Dusa, Mircea; Vleeming, Bert; Hepp, Birgitt; Maenhoudt, Mireille; Cheng, Shaunee; Vandeweyer, Tom

Issue

1

Journal

J. Micro/Nanolithography, MEMS, and MOEMS

Volume

8

Title

Double patterning lithography for 32 nm: critical dimensions uniformity and overlay control considerations

Publication type

Journal article