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Double patterning lithography for 32 nm: critical dimensions uniformity and overlay control considerations
Publication:
Double patterning lithography for 32 nm: critical dimensions uniformity and overlay control considerations
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Date
2009
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Finders, Jo
;
Dusa, Mircea
;
Vleeming, Bert
;
Hepp, Birgitt
;
Maenhoudt, Mireille
;
Cheng, Shaunee
;
Vandeweyer, Tom
Journal
J. Micro/Nanolithography, MEMS, and MOEMS
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1986
since deposited on 2021-10-17
2
last month
1
last week
Acq. date: 2026-01-10
Citations
Metrics
Views
1986
since deposited on 2021-10-17
2
last month
1
last week
Acq. date: 2026-01-10
Citations