Browsing by author "Ameen, Mike"
Now showing items 1-4 of 4
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Cost effective low Vt Ni-FUSI CMOS on SiON by means of Al implant (pMOS) and Yb+P implant (nMOS)
Lauwers, Anne; Veloso, Anabela; Chang, Shou-Zen; Yu, HongYu; Hoffmann, Thomas Y.; Kerner, Christoph; Demand, Marc; Rothschild, Aude; Niwa, Masaaki; Satoru, Ito; Mitshashi, Riichirou; Ameen, Mike; Whittemore, Graham; Pawlak, Malgorzata; Vrancken, Christa; Demeurisse, Caroline; Mertens, Sofie; Vandervorst, Wilfried; Absil, Philippe; Biesemans, Serge; Kittl, Jorge (2008) -
Implementation of molecular ion implant technology for PMOS extension
Falepin, Annelies; Collart, Erik; Tran, Sandra; Harris, Mark; Ameen, Mike; Hoffmann, Thomas Y.; Rosseel, Erik; Saino, Kanto; Horiguchi, Naoto; Absil, Philippe (2008) -
Influence of the process sequence and termal budget on the strain of SiC stressor layers formed by ion implantation
Rosseel, Erik; Ortolland, Claude; Hikavyy, Andriy; Schram, Tom; Falepin, Annelies; Hoffmann, Thomas Y.; Douhard, Bastien; Moussa, Alain; Vandervorst, Wilfried; Ameen, Mike; Rubin, Leonard (2010) -
Influence of the process sequence and termal budget on the straion fof SiC stressor layers formed by Ion Implantation
Rosseel, Erik; Ortolland, Claude; Hikavyy, Andriy; Schram, Tom; Falepin, Annelies; Hoffmann, Thomas Y.; Vandervorst, Wilfried; Ameen, Mike; Rubin, Leonard (2010-10)