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Influence of the process sequence and termal budget on the straion fof SiC stressor layers formed by Ion Implantation
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Authors
Rosseel, Erik
;
Ortolland, Claude
;
Hikavyy, Andriy
;
Schram, Tom
;
Falepin, Annelies
;
Hoffmann, Thomas Y.
;
Vandervorst, Wilfried
;
Ameen, Mike
;
Rubin, Leonard
Conference
18th IEEE International Conference on Advanced Thermal Processing of Semiconductors - RTP
Title
Influence of the process sequence and termal budget on the straion fof SiC stressor layers formed by Ion Implantation
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