Browsing by author "Gangala, Hareen K"
Now showing items 1-6 of 6
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0.18 μm KrF lithography using optical proximity correction based on empirical behavior modeling
Tritchkov, Alexander; Stirnimann, J.; Gangala, Hareen K; Ronse, Kurt (1998) -
CD control using SiON BARL processing for sub 0.25µm lithography
Zhang, Fenghong; Op de Beeck, Maaike; Ronse, Kurt; Gangala, Hareen K; Gopalan, P.; Conley, P.; Dusa, M.; Bendik, Joe (1998) -
CD control using SiON BARL processing for sub-0.25μm lithography
Zhang, Fenghong; Op de Beeck, Maaike; Schaekers, Marc; Ronse, Kurt; Conley, W.; Gopalan, P.; Gangala, Hareen K; Dusa, M.; Bendik, Joe (1999) -
Lithography simulation with aerial image - variable threshold resist model
Randall, John; Gangala, Hareen K; Tritchkov, Alexander (1999) -
Lithography simulation with aerial image-variable threshold resist model
Randall, John; Gangala, Hareen K; Tritchkov, Alexander (1998) -
Qualification of electrical linewidth measurements (ELM) as a metrology tool for 0.18μm and below
Marschner, Thomas; Pollentier, Ivan; Baerts, Christina; Boltz, Ingo; Ronse, Kurt; Van den hove, Luc; Finders, Jo; Gangala, Hareen K; Capodieci, Luigi (1998)