Browsing by author "Bajolet, Philippe"

Now showing items 1-6 of 6

    • ALD HfO2 surface preparation study 

      Delabie, Annelies; Caymax, Matty; Maes, Jan; Bajolet, Philippe; Brijs, Bert; Cartier, Eduard; Conard, Thierry; De Gendt, Stefan; Richard, Olivier; Vandervorst, Wilfried; Zhao, Chao; Green, Martin; Tsai, Wilman; Heyns, Marc (2003)

    • Atomic layer deposition and remote plasma surface preparation for gate stack applications 

      Delabie, Annelies; Caymax, Matty; Brijs, Bert; Cartier, E.; Geenen, Luc; Vandervorst, Wilfried; Bajolet, Philippe; Maes, Jan; Tsai, Wilman; De Gendt, Stefan; Heyns, Marc (2003)

    • Gate stack preparation with high-k materials in a cluster tool 

      De Gendt, Stefan; Heyns, Marc; Conard, Thierry; Nohira, Hiroshi; Richard, Olivier; Vandervorst, Wilfried; Caymax, Matty; Maes, Jos; Tuominen, Marko; Bajolet, Philippe (2001)

    • Maximization of active As doping (selective) epitaxial Si and SiGe layers 

      Loo, Roger; Bajolet, Philippe; Bauer, Matthias; Maes, Jan-Willem; Caymax, Matty; Arena, Chantal (2004-10)

    • Scaling of high-k dielectrics towards sub-1nm EOT 

      Heyns, Marc; Beckx, Stephan; Bender, Hugo; Blomme, Pieter; Boullart, Werner; Brijs, Bert; Carter, Richard; Caymax, Matty; Claes, Martine; Conard, Thierry; De Gendt, Stefan; Degraeve, Robin; Delabie, Annelies; Deweerd, Wim; Groeseneken, Guido; Henson, Kirklen; Kauerauf, Thomas; Kubicek, Stefan; Lucci, Luca; Lujan, Guilherme; Mentens, Jimmy; Pantisano, Luigi; Petry, Jasmine; Richard, Olivier; Röhr, Erika; Schram, Tom; Vandervorst, Wilfried; Van Doorne, Patrick; Van Elshocht, Sven; Westlinder, Jörgen; Witters, Thomas; Zhao, Chao; Cartier, Eduard; Chen, Jerry; Cosnier, Vincent; Green, Martin; Jang, Se Aug; Kaushik, Vidya; Kerber, Andreas; Kluth, Jon; Lin, Steven; Tsai, Wilman; Young, Edward; Manabe, Yukiko; Shimamoto, Yasuhiro; Bajolet, Philippe; De Witte, Hilde; Maes, Jan; Date, Lucien; Pique, Didier; Coenegrachts, Bart; Vertommen, Johan; Passefort, Sophie (2003)

    • Thermal stability and scalability of zr-aluminate-based high-k gate stacks 

      Chen, Jerry; Cartier, Eduard; Carter, Richard; Kauerauf, Thomas; Zhao, Chao; Pétry, Jasmine; Cosnier, Vincent; Xu, Zhen; Kerber, Andreas; Tsai, Wilman; Young, Edward; Kubicek, Stefan; Caymax, Matty; Vandervorst, Wilfried; De Gendt, Stefan; Heyns, Marc; Copel, M.; Besling, Wim; Bajolet, Philippe; Maes, Jan (2002)