Browsing by author "van Wingerden, Johannes"
Now showing items 1-5 of 5
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Bottom-ARC optimization methodology for 0.25μm lithography and beyond
Op de Beeck, Maaike; Vandenberghe, Geert; Jaenen, Patrick; Feng, Hong Zhang; Delvaux, Christie; Richardson, Paul; Van Puyenbroeck, Ilse; Ronse, Kurt; Lamb, J. E.; van der Hilst, J. B. C.; van Wingerden, Johannes (1998) -
Comparisons of 9% versus 6% transmission attenuated phase shift mask for the 65nm device node
Montgomery, Patrick K.; Litt, Lloyd; Conley, Will; Lucas, Kevin; van Wingerden, Johannes; Vandenberghe, Geert; Wiaux, Vincent (2004) -
Comparisons of 9% versus 6% transmission attenuated phase-shift mask for the 65nm device mode
Montgomery, Patrick K.; Lucas, Kevin D.; Litt, Lloyd C.; Conley, Will; Fanucchi, Eric; van Wingerden, Johannes; Vandenberghe, Geert; Wiaux, Vincent; Taylor, Darren; Cangemi, Michael J.; Kasprowicz, Bryan (2003-12) -
Process, design and optical proximity correction requirements for the 65nm device generation
Lucas, Kevin; Montgomery, Patrick; Litt, Lloyd C.; Conley, Will; Postnikov, Sergei V.; Wu, Wei; Yuan, Chi-Min; Olivares, Marc; Strozewski, Kirk; Carter, Russell L.; Vasek, James; Smith, David; Fanucchi, Eric L.; Wiaux, Vincent; Vandenberghe, Geert; Toublan, Olivier; Verhappen, Arjan; Kuijten, Jan P.; van Wingerden, Johannes; Kasprowicz, Bryan S.; Tracy, Jeffrey W.; Progler, Christopher J.; Shiro, Eugene; Topouzov, Igor; Wimmer, Karl; Roman, Bernard J. (2003) -
SPM characterizaton of anomalies in phase shift mask and their effect on wafer features
Muckenhirn, S.; Meyyappan, A.; Walch, K.; Maslow, M.; Vandenberghe, Geert; van Wingerden, Johannes (2001)