Browsing by author "Orain, Isabelle"
Now showing items 1-3 of 3
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15nm half-pitch patterning: EUV + SELF-aligned double patterning
Versluijs, Janko; Souriau, Laurent; Hellin, David; Orain, Isabelle; Kimura, Yoshie; Kunnen, Eddy; Dekkers, Harold; Shi, Xiaoping; Albert, Johan; Wiaux, Vincent; Xu, Kaidong (2012) -
15nm HP patterning with EUV lithography and SADP
Souriau, Laurent; Hellin, David; Kunnen, Eddy; Versluijs, Janko; Dekkers, Harold; Albert, Johan; Orain, Isabelle; Yoshie, Kimura; Xu, Kaidong; Vertommen, Johan; Wiaux, Vincent; Boullart, Werner (2012) -
Key contributors for improvement of line width roughness, line edge roughness, and critical dimension uniformity: 15 nm half-pitch patterning with extreme ultraviolet and self-aligned double patterning
Xu, Kaidong; Souriau, Laurent; Hellin, David; Versluijs, Janko; Wong, Patrick; Vangoidsenhoven, Diziana; Vandenbroeck, Nadia; Dekkers, Harold; Shi, Xiaoping; Albert, Johan; Tan, Chi Lim; Vertommen, Johan; Coenegrachts, Bart; Orain, Isabelle; Kimura, Yoshie; Wiaux, Vincent; Boullart, Werner (2013-09)