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15nm half-pitch patterning: EUV + SELF-aligned double patterning
Publication:
15nm half-pitch patterning: EUV + SELF-aligned double patterning
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Date
2012
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Versluijs, Janko
;
Souriau, Laurent
;
Hellin, David
;
Orain, Isabelle
;
Kimura, Yoshie
;
Kunnen, Eddy
;
Dekkers, Harold
;
Shi, Xiaoping
;
Albert, Johan
;
Wiaux, Vincent
;
Xu, Kaidong
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Acq. date: 2026-01-06
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Views
2079
since deposited on 2021-10-20
2
last month
Acq. date: 2026-01-06
Citations