Publication:

15nm half-pitch patterning: EUV + SELF-aligned double patterning

Date

2012
Presentation
Simple item page Full metadata Statistics
 
dc.contributor.authorVersluijs, Janko
dc.contributor.authorSouriau, Laurent
dc.contributor.authorHellin, David
dc.contributor.authorOrain, Isabelle
dc.contributor.authorKimura, Yoshie
dc.contributor.authorKunnen, Eddy
dc.contributor.authorDekkers, Harold
dc.contributor.authorShi, Xiaoping
dc.contributor.authorAlbert, Johan
dc.contributor.authorWiaux, Vincent
dc.contributor.authorXu, Kaidong
dc.contributor.imecauthorVersluijs, Janko
dc.contributor.imecauthorSouriau, Laurent
dc.contributor.imecauthorHellin, David
dc.contributor.imecauthorDekkers, Harold
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.orcidimecSouriau, Laurent::0000-0002-5138-5938
dc.contributor.orcidimecDekkers, Harold::0000-0003-4778-5709
dc.date.accessioned2021-10-20T18:31:45Z
dc.date.available2021-10-20T18:31:45Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21797
dc.source.conferenceInternational Symposium on Extreme Ultraviolet Lithography - EUVL
dc.source.conferencedate30/09/2012
dc.source.conferencelocationBrussels Belgium
dc.title

15nm half-pitch patterning: EUV + SELF-aligned double patterning

dc.typeOral presentation
dspace.entity.typePublication
Files
Publication available in collections:
Presentations