Browsing by author "Van Puyenbroeck, Ilse"
Now showing items 1-5 of 5
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Bottom-ARC optimization methodology for 0.25μm lithography and beyond
Op de Beeck, Maaike; Vandenberghe, Geert; Jaenen, Patrick; Feng, Hong Zhang; Delvaux, Christie; Richardson, Paul; Van Puyenbroeck, Ilse; Ronse, Kurt; Lamb, J. E.; van der Hilst, J. B. C.; van Wingerden, Johannes (1998) -
How to use DUV BARCs on topography
Op de Beeck, Maaike; Vandenberghe, Geert; Jaenen, Patrick; Zhang, Fenghong; Delvaux, Christie; Van Puyenbroeck, Ilse; Ronse, Kurt (1998) -
Optimisation of bottom-ARC processes with respect to CD control
Op de Beeck, Maaike; Vandenberghe, Geert; Jaenen, Patrick; Zhang, Fenghong; Delvaux, Christie; Van Puyenbroeck, Ilse; Ronse, Kurt; Lamb, J. E.; van der Hilst, J. B. C. (1998) -
Optimization of an advanced positive DUV resist for 248 nm L/S pattern printing
Ercken, Monique; Pollers, Ingrid; Van Puyenbroeck, Ilse; Goethals, Mieke; Ronse, Kurt; Pawlowski, G.; Spiess, Walter (1998) -
Optimization of an advanced positive DUV resist for 248 nm L/S pattern printing
Ercken, Monique; Moelants, Myriam; Pollers, Ingrid; Van Puyenbroeck, Ilse; Goethals, Mieke; Ronse, Kurt; Pawlowski, G.; Spiess, Walter (1999)