Browsing by author "Welling, Ulrich"
Now showing items 1-4 of 4
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Mask absorber, mask tone, and wafer process impact on resist line-edge-roughness
Ohtomi, Eisuke; Philipsen, Vicky; Welling, Ulrich; Melvin III, Lawrence S.; Takahata, Yosuke; Tanaka, Yusuke; De Simone, Danilo (2023) -
Power spectral density as template for modeling a metal-oxide nanocluster resist to obtain accurate resist roughness profiles
Severi, Joren; Welling, Ulrich; De Simone, Danilo; De Gendt, Stefan (2021) -
Resist line edge roughness mitigation for high-NA EUVL
Ohtomi, Eisuke; Philipsen, Vicky; Severi, Joren; Welling, Ulrich; Tanaka, Yusuke; De Simone, Danilo (2022) -
Stochastic simulation and calibration of organometallic photoresists for extreme ultraviolet lithography
Belete, Zelalem; De Bisschop, Peter; Welling, Ulrich; Erdmann, Andreas (2021)