Browsing by author "Izumi, A."
Now showing items 1-5 of 5
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Application of single-wafer wet cleaning prior to epitaxial SiGe process
Sano, Ken-Ichi; Wada, Masayuki; Leys, Frederik; Loo, Roger; Hikavyy, Andriy; Mertens, Paul; Snow, Jim; Izumi, A.; Miya, Katsuhiko; Eitoku, Atsuro (2009) -
Challenges of single-wafer wet cleaning for low temperature pre-epitaxial treatment of SiGe
Sano, K.; Leys, Frederik; Dilliway, Gabriela; Loo, Roger; Mertens, Paul; Snow, J.; Izumi, A.; Eitoku, A. (2008) -
Effect of chemical growth air filter for wafer storage before epitaxial growth
Wada, Masayuki; Sano, Tomohiro; Leys, Frederik; Dilliway, G.; Loo, Roger; Mertens, Paul; Snow, j.; Izumi, A.; Eitoku, A. (2008) -
Single-wafer wet chemical oxide formation for pre-ALD high-k deposition on 300 mm wafer
Sano, K.; Izumi, A.; Eitoku, A.; Snow, J.; Nyns, Laura; Kubicek, Stefan; Singanamalla, Raghunath; Richard, Olivier; Conard, Thierry; Vos, Rita; Mertens, Paul (2008) -
Single-wafer wet cleaning for a high particle removal efficiency on hydrophobic surface
Sano, Ken-Ichi; Izumi, A.; Eitoku, Atsuro; Snow, Jim; Kesters, Els; Mertens, Paul (2005)