Browsing by author "Hofmann, Thorsten"
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Additional evidence of EUV blank defects first seen by wafer printing
Jonckheere, Rik; Van Den Heuvel, Dieter; Hendrickx, Eric; Ronse, Kurt; Bret, Tristan; Hofmann, Thorsten; Magana, John; Aharonson, Israel; Meshulach, Doron (2011) -
EUV mask repair using a combination of focused-electron-beam-induced processing and vacuum Atomic Force Microscopy
Bret, Tristan; Baralia, Gabriel; Baur, Christof; Budach, Michael; Hofmann, Thorsten; Edinger, Klaus; Magana, John; Jonckheere, Rik; Van Den Heuvel, Dieter (2011) -
Evidence of printing blank-related defects on EUV masks missed by blank inspection
Jonckheere, Rik; Van Den Heuvel, Dieter; Hendrickx, Eric; Ronse, Kurt; Bret, Tristan; Hofmann, Thorsten; Magana, John; Aharonson, Israel; Meshulach, Doron (2011) -
Predictive modeling of EUV-lithography: the role of mask, optics, and photoresist effects
Erdmann, Andreas; Shao, Feng; Evanschitzky, Peter; Fuehner, Tim; Lorusso, Gian; Hendrickx, Eric; Goethals, Mieke; Jonckheere, Rik; Bret, Tristan; Hofmann, Thorsten (2011)