Now showing items 1-3 of 3

    • ALD deposition of high-k and metal gate stacks for advanced CMOS applications 

      Heyns, Marc; Beckx, Stephan; Caymax, Matty; Claes, Martine; De Gendt, Stefan; Degraeve, Robin; Delabie, Annelies; Deweerd, Wim; Groeseneken, Guido; Hooker, Jacob; Houssa, Michel; Kwak, Dong Hwa; Lander, Rob; Lujan, Guilherme; Maes, Jan; Niwa, Masaaki; Pantisano, Luigi; Puurunen, R.; Ragnarsson, Lars-Ake; Rohr, Erika; Schram, Tom; Van Elshocht, Sven; Vandervorst, Wilfried (2004)
    • Atomic layer deposition of hafnium oxide on germanium substrates 

      Delabie, Annelies; Puurunen, R.; Brijs, Bert; Caymax, Matty; Conard, Thierry; Onsia, Bart; Richard, Olivier; Vandervorst, Wilfried; Zhao, Chao; Heyns, Marc; Meuris, Marc; Viitanan, Minna M.; Brongersma, Hidde H.; De Ridder, M.; Goncharova, L.; Garfunkel, Eric; Gustafsson, Torgny; Tsai, Wilman (2005)
    • The future of high-k on pure germanium and its importance for Ge CMOS 

      Meuris, Marc; Delabie, Annelies; Van Elshocht, Sven; Kubicek, Stefan; Verheyen, Peter; De Jaeger, Brice; Van Steenbergen, Jan; Winderickx, Gillis; Van Moorhem, Els; Puurunen, R.; Brijs, Bert; Caymax, Matty; Conard, Thierry; Richard, Olivier; Vandervorst, Wilfried; Zhao, Chao; De Gendt, Stefan; Schram, Tom; Chiarella, Thomas; Onsia, Bart; Teerlinck, I; Houssa, Michel; Mertens, Paul; Raskin, G.; Mijlemans, P.; Biesemans, Serge; Heyns, Marc (2005)