Now showing items 1-2 of 2

    • Strain enhanced FUSI/HfSiON technology with optimized CMOS process window 

      Veloso, Anabela; Verheyen, Peter; Vos, Rita; Brus, Stephan; Ito, Satoru; Mitsuhashi, Riichirou; Paraschiv, Vasile; Shi, Xiaoping; Onsia, Bart; Arnauts, Sophia; Loo, Roger; Lauwers, Anne; Conard, Thierry; de Marneffe, Jean-Francois; Goossens, Danny; Baute, Debbie; Locorotondo, Sabrina; Chiarella, Thomas; Kerner, Christoph; Vrancken, Christa; Mertens, Sofie; O'Sullivan, Barry; Yu, HongYu; Chang, Shou-Zen; Niwa, Masaaki; Kittl, Jorge; Absil, Philippe; Jurczak, Gosia; Hoffmann, Thomas Y.; Biesemans, Serge (2007)
    • Work-function engineering for 32nm node pMOS devices: high-performance TaCNO-gated films 

      O'Sullivan, Barry; Mitsuhashi, Riichirou; Ito, Satoru; Oikawa, Kota; Kubicek, Stefan; Paraschiv, Vasile; Adelmann, Christoph; Veloso, Anabela; Yu, HongYu; Schram, Tom; Biesemans, Serge; Nakabayashi, Takashi; Ikeda, Atsushi; Niwa, Masaaki (2008)