Work-function engineering for 32nm node pMOS devices: high-performance TaCNO-gated films

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Authors

O'Sullivan, Barry; Mitsuhashi, Riichirou; Ito, Satoru; Oikawa, Kota; Kubicek, Stefan; Paraschiv, Vasile; Adelmann, Christoph; Veloso, Anabela; Yu, HongYu; Schram, Tom; Biesemans, Serge; Nakabayashi, Takashi; Ikeda, Atsushi; Niwa, Masaaki

ISSN

0741-3106

Issue

11

Journal

IEEE Electron Device Letters

Volume

29

Title

Work-function engineering for 32nm node pMOS devices: high-performance TaCNO-gated films

Publication type

Journal article

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