Browsing by author "Schmoeller, T."

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Accurate EUV lithography simulation enabled by calibrated physical resist models

Klostermann, U.K.; Mulders, T.; Schmoeller, T.; Demmerle, W.; Lorusso, Gian; Hendrickx, Eric (2010-09)
Investigation of mask defectivity in full field EUV lithography

Jonckheere, Rik; Iwamoto, Fumio; Lorusso, Gian; Goethals, Mieke; Ronse, Kurt; Koop, H.; Schmoeller, T. (2007)