Investigation of mask defectivity in full field EUV lithography

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Authors
Jonckheere, Rik; Iwamoto, Fumio; Lorusso, Gian; Goethals, Mieke; Ronse, Kurt; Koop, H.; Schmoeller, T.
Conference
SPIE Photomask Technology (BACUS)
Title
Investigation of mask defectivity in full field EUV lithography
Publication type
Proceedings paper
Embargo date
9999-12-31
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