Publication:

Investigation of mask defectivity in full field EUV lithography

Date

2007
Proceedings Paper
Simple item page Full metadata Statistics
 
dc.contributor.authorJonckheere, Rik
dc.contributor.authorIwamoto, Fumio
dc.contributor.authorLorusso, Gian
dc.contributor.authorGoethals, Mieke
dc.contributor.authorRonse, Kurt
dc.contributor.authorKoop, H.
dc.contributor.authorSchmoeller, T.
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.accessioned2021-10-16T16:58:17Z
dc.date.available2021-10-16T16:58:17Z
dc.date.embargo9999-12-31
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12367
dc.source.beginpage673012
dc.source.conferenceSPIE Photomask Technology (BACUS)
dc.source.conferencedate17/09/2007
dc.source.conferencelocationMonterey, CA USA
dc.title

Investigation of mask defectivity in full field EUV lithography

dc.typeProceedings paper
dspace.entity.typePublication
Files

Original bundle

Name:
15248.pdf
Size:
390.95 KB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Conference contributions