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Investigation of mask defectivity in full field EUV lithography
Publication:
Investigation of mask defectivity in full field EUV lithography
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Date
2007
Proceedings Paper
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15248.pdf
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Jonckheere, Rik
;
Iwamoto, Fumio
;
Lorusso, Gian
;
Goethals, Mieke
;
Ronse, Kurt
;
Koop, H.
;
Schmoeller, T.
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1939
since deposited on 2021-10-16
1
last month
Acq. date: 2025-12-09
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Metrics
Views
1939
since deposited on 2021-10-16
1
last month
Acq. date: 2025-12-09
Citations