Browsing by author "Ghekiere, John"
Now showing items 1-3 of 3
-
Alternative post-etch polymer removal in a single-wafer platform
Dundas, C.; Vroom, R.; Ghekiere, John; Van Doorne, Patrick; Rink, I.; Sharp, I.; Heffernan, S. (2003) -
Effective post-etch residue removal on low-K films using single wafer processing
Kesters, Els; Ghekiere, John; Van Doorne, Patrick; Vereecke, Guy; Mertens, Paul; Heyns, Marc (2004) -
Effective post-etch residue removal on low-k films using single wafer processing
Kesters, Els; Ghekiere, John; Van Doorne, Patrick; Vereecke, Guy; Mertens, Paul; Heyns, Marc (2003)